FinFET Process Integration (Semiconductor Academy 7)

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课程主页: https://www.udemy.com/course/finfet-process-integration-semiconductor-academy-7/

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**课程名称:** FinFET 工艺集成(半导体学院 7) **课程概述:** 本课程全面介绍了 FinFET 工艺流程和应变硅(Strained Si)技术。您将学习关键的工艺概念以及每个工艺步骤的目的,从而掌握进入半导体代工厂最前沿的知识和技能。 **课程内容要点:** 1. **FinFET 介绍:** * 什么是 FinFET? * 为什么需要 FinFET? 2. **FinFET 工艺流程概览:** * **前道工序 (FEOL):** 晶体管的形成 * **中道工序 (MEOL):** 接触点的形成 * **后道工序 (BEOL):** 互连线的形成 3. **前道工序 (FEOL):晶体管的形成** * Fin 形成 * STI(浅沟槽隔离)工程 * 掺杂区(Well)工程 * 栅极(Gate)工程 * LDD(轻掺杂漏区)/ 间隔层(Spacer)/ 源漏区(S&D)外延/ 硅化物(Silicide)/ ILD(层间介质)工程 4. **HKMG(高 K 栅极)技术:** * 什么是 HKMG 及其优势? * HKMG 与多晶硅栅极(Poly Gate)的比较 5. **HCI(热载流子注入)效应介绍** 6. **应变硅(Strained Silicon)技术介绍:** * 材料科学:SiGe 与 SiP 外延 7. **中道工序 (MEOL):接触点形成** * MP/MD 形成 8. **后道工序 (BEOL):互连线形成** * 金属层工程 * IMD(金属间介质)/ Via(垂直互连)工程 * 钝化/ AP 工程 * 双大马士革(Dual Damascene)工艺 9. **总结与展望:** * 从过去课程到未来课程的概述

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This course provides a comprehensive overview of FinFET process flow and strained Si technique. You'll learn critical process concepts and purpose of each process step, equipping you with the state-of-the-art knowledge and skills to enter the semiconductor foundries.What you will learn in this class ? (1) What is FinFET & Why we need FinFET?(2) FinFET Process OverviewFront end of line (FEOL): Transistor formation Middle end of line (MEOL): Contact formation Back end of line (BEOL): Interconnect formation(3) Front End of Line (FEOL): Transistor Formation, including the following steps, Fin formationSTI (Shallow Trench Isolation) engineeringWell engineeringGate engineeringLDD (Lightly Doped Drain)/ Spacer/ S & D Epitaxy/ Silicide/ ILD (Inter Layer Dielectric) engineering(4) HKMG (High-K Metal Gate) techniqueWhat is HKMG and its advantageComparison between HKMG and Poly Gate(5) Introduction to HCI (Hot Carrier Injection) effect(6) Introduction to Strained Silicon techniqueMaterial Science: SiGe & SiP epitaxy(7) Middle End of Line (MEOL): Contact Formation, including the following steps, MP/MD formation(8) Back End of Line (BEOL): Interconnect Formation, including the following steps, Metal layer engineeringIMD (Inter Metal Dielectric) / Via engineering Passivation/ AP engineering Dual Damascene process(9) Ending & Forecast:An overview from past courses to future courses

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