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所在平台: Coursera |
课程主页: https://www.coursera.org/learn/optical-and-x-ray-characterization
课程评论：没有评论
课程名称：光学与X射线表征 课程概述：光学和X射线技术是表征半导体薄膜的强大工具。这些技术可以用来测量薄膜的厚度、纯度和晶体质量，还可以进行成分分析。现代技术快速、即开即用，通常是无损的，能够快速评估材料特性。本课程描述了光学和X射线表征的基本原理，并提供了实际应用实例，展示它们在半导体制造中的应用。 课程大纲： 1. 课程介绍：介绍光学和X射线表征技术及其在半导体薄膜中的应用。 2. 第5周第1节：反射光谱学：介绍反射光谱学的概念，这是一种快速、方便且无损的测量透明材料厚度的技术。 3. 第5周第2节：椭圆偏振法：学习椭圆偏振法，这是一种强大的技术，可以提取厚度和折射率，适用于厚度仅为数纳米的透明层。 4. 第5周第3节：光致发光：学习光致发光及其相关应用。 5. 第5周第4节：电子探针X射线分析：学习电子探针X射线分析的原理与方法。 6. 第5周第5节：课程总结与项目：完成一个案例研究，评估分析电子探针X射线图像以确定40纳米MOSFET中成分元素的能力。 本课程通过理论与实践结合，帮助学生掌握现代光学和X射线表征技术在半导体行业中的实际应用。
Name:Course Introduction
Description:Optical and X-ray techniques are powerful ways to characterize semiconductor thin films. They can be used to measure film thickness, purity and crystalline quality, and for compositional analysis. Modern techniques are fast, turn-key, and generally non-destructive, allowing for rapid assessment of material properties. This course describes the fundamentals of optical and X-ray characterization and provides real-world examples of how they are used in semiconductor manufacturing.
Name:Week 5.1: Reflectance Spectroscopy
Description:This week introduces the concept of reflectance spectroscopy: a rapid, convenient, and non-destructive technique for measuring the thickness of transparent materials.
Name:Week 5.2: Ellipsometry
Description:This week, you will learn about ellipsometry, a powerful technique that allows us to extract the thickness and refractive index of transparent layers as thin as a few nanometers.
Name:Week 5.3: Photoluminescence
Description:This week, you will learn about photoluminescence.
Name:Week 5.4: Electron Microprobe X-Ray Analysis
Description:This week, you will learn about electron microprobe X-ray analysis.
Name:Week 5.5: Course Wrap-up and Project
Description:This week, you will complete a case study to assess your ability to analyze electron microprobe x-ray images to determine the constituent elements in a 40 nm MOSFET.
Optical and X-ray techniques are powerful ways to characterize semiconductor thin films. They can be used to measure film thickness, purity and crystalline quality, and for compositional analysis. Modern techniques are fast, turn-key, and generally non-destructive, allowing for rapid assessment of material properties. This course describes the fundamentals of optical and X-ray characterization and provides real-world examples of how they are used in semiconductor manufacturing.
